In this book basic and some more advanced thermodynamics and phase as well as stability diagrams relevant for diffusion studies are introduced. Following, Fick’s laws of diffusion, atomic mechanisms, interdiffusion, intrinsic diffusion, tracer diffusion and the Kirkendall effect are discussed. Short circuit diffusion is explained in detail with an emphasis on grain boundary diffusion. Recent advances in the area of interdiffusion will be introduced. Interdiffusion in multi-component systems is also explained. Many practical examples will be given, such that researches working in this area can learn the practical evaluation of various diffusion parameters from experimental results. Large number of illustrations and experimental results are used to explain the subject. This book will be appealing for students, academicians, engineers and researchers in academic institutions, industry research and development laboratories.
Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced. In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes: solutions to several common reliability issues in microsystem technology, methods to understand and predict failure mechanisms at interfaces between dissimilar materials and an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA. Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.
Mäkelä's study brings together German, Nordic and Anglo-American work on Sibelius, and synthesizes these various strands of Sibelius reception into a single coherent critical narrative. This acclaimed study, available in English for the first time, looks at the music of Jean Sibelius in its biographical context. Myths have surrounded Sibelius [1865-1957] and his work, for more than 100 years, often diverting attention away from his creative output. Drawing on many unpublished sources, Mäkelä's study leads us back to Sibelius as a musician and a 'poet' of universal validity. Chapters examine the composer's creativity, inspiration, influence, aspects of genre, as well as the relationship of the artist with nature and homeland. Those who knew Sibelius at an early age tell of a youthful bohemian in the midst of European decadence. This 'age of Carmen'[Eduard Munch] marked Sibelius's formative years. The composer's most important works, dating from a time between his third symphony and Tapiola, reflect the modernistic mainstream. Sibelius's last three decades, known asthe 'Silence of Ainola', have inspired the masculine clichés that this book deconstructs. Sibelius was one of the least political artists of his time who nevertheless became heavily politicized. The first supreme musical talent in the region, he gave his nation a genuine sound. Europeans of the late nineteenth century showed increasing affinity with Nordic culture. Aino, Sibelius's wife, was instrumental in creating the image of her husband as a Nordic icon. The book closely scrutinizes this popular image. In an Anglo-American artistic context his mix of regionalism and modernity remained attractive even when these elements went out of fashion in the art movement of continental Europe. Ideas of Finland and the North vastly influenced the interpretation of meaning in Sibelius's music, a music that until this day remains enigmatic.
Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced. In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes: solutions to several common reliability issues in microsystem technology, methods to understand and predict failure mechanisms at interfaces between dissimilar materials and an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA. Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.
In this book basic and some more advanced thermodynamics and phase as well as stability diagrams relevant for diffusion studies are introduced. Following, Fick’s laws of diffusion, atomic mechanisms, interdiffusion, intrinsic diffusion, tracer diffusion and the Kirkendall effect are discussed. Short circuit diffusion is explained in detail with an emphasis on grain boundary diffusion. Recent advances in the area of interdiffusion will be introduced. Interdiffusion in multi-component systems is also explained. Many practical examples will be given, such that researches working in this area can learn the practical evaluation of various diffusion parameters from experimental results. Large number of illustrations and experimental results are used to explain the subject. This book will be appealing for students, academicians, engineers and researchers in academic institutions, industry research and development laboratories.
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