Shuyan Xu's Books

Plasma-Aided Nanofabrication

From Plasma Sources to Nanoassembly

By: Ken Ostrikov,Shuyan Xu

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Plasma-Aided Nanofabrication

From Plasma Sources to Nanoassembly

By: Ken Ostrikov,Shuyan Xu

In this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics. Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications.

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Page Count

315

Publisher

John Wiley & Sons

Published Date

ISBN 10

3527611568

ISBN 13

9783527611560

Advanced Concepts and Architectures for Plasma-Enabled Material Processing

By: Oleg O. Baranov,Igor Levchenko,Shuyan Xu,Kateryna Bazaka

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Advanced Concepts and Architectures for Plasma-Enabled Material Processing

By: Oleg O. Baranov,Igor Levchenko,Shuyan Xu,Kateryna Bazaka

Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.

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