Paul F. Fewster's Books

X-Ray Scattering from Semiconductors and Other Materials

By: Paul F. Fewster

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X-Ray Scattering from Semiconductors and Other Materials

By: Paul F. Fewster

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included. This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

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Page Count

510

Publisher

World Scientific

Published Date

ISBN 10

9814436933

ISBN 13

9789814436939

X-ray Scattering From Semiconductors (2nd Edition)

By: Paul F Fewster

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X-ray Scattering From Semiconductors (2nd Edition)

By: Paul F Fewster

This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection.The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces.A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented.

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Page Count

315

Publisher

World Scientific

Published Date

ISBN 10

178326098X

ISBN 13

9781783260980

X-ray Scattering From Semiconductors

By: Paul F Fewster

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X-ray Scattering From Semiconductors

By: Paul F Fewster

X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, etc.This book provides a thorough description of the techniques involved in obtaining that information, including X-ray diffractometers and their associated instrument functions, data collection methods, and the simulation of the diffraction patterns observed. Also presented are examples and procedures for interpreting the data to build a picture of the sample, much of which will be common to materials other than semiconductors./a

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Page Count

303

Publisher

World Scientific

Published Date

ISBN 10

1783262079

ISBN 13

9781783262076

Thin Film Analysis by X-Ray Scattering

By: Mario Birkholz

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Thin Film Analysis by X-Ray Scattering

By: Mario Birkholz

With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.

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Page Count

378

Publisher

Wiley-VCH

Published Date

ISBN 10

3527310525

ISBN 13

9783527310524

Book's by Paul F. Fewster

X-Ray Scattering from Semiconductors and Other Materials

X-Ray Scattering from Semiconductors and Other Materials

X-ray Scattering From Semiconductors (2nd Edition)

X-ray Scattering From Semiconductors (2nd Edition)

X-ray Scattering From Semiconductors

X-ray Scattering From Semiconductors

Thin Film Analysis by X-Ray Scattering

Thin Film Analysis by X-Ray Scattering

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