This book is devoted to a thorough investigation of the physics and applications of the vacuum arc – a highly-ionized metallic plasma source used in a number of applications – with emphasis on cathode spot phenomena and plasma formation. The goal is to understand the origins and behavior of the various complex and sometimes mysterious phenomena involved in arc formation, such as cathode spots, electrode vaporization, and near-electrode plasma formation. The book takes the reader from a model of dense cathode plasma based on charge-exchange ion-atom collisions through a kinetic approach to cathode vaporization and on to metal thermophysical properties of cathodes. This picture is further enhanced by an in-depth study of cathode jets and plasma acceleration, the effects of magnetic fields on cathode spot behavior, and electrical characteristics of arcs and cathode spot dynamics. The book also describes applications to space propulsion, thin film deposition, laser plasma generation, and magnetohydrodynamics, making this comprehensive and up-to-date volume a valuable resource for researchers in academia and industry.
Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
In 1911, Franz Kafka encountered the Kaiser Panorama: a stereoscopic peep show offering an illusion of three-dimensional depth. After the experience, he began to emulate the apparatus in his literary sketches, developing a style we might call "stereoscopic," juxtaposing, like the optical stereoscope, two images of the same object seen from slightly different perspectives. Isak Winkel Holm argues that Kafka's stereoscopic style is crucial to an understanding of the relation between literature and politics in Kafka's work. At the level of content, the stereoscopic style offers a representation of the basic order of a specific community. At the level of form, the stereoscopic style is structured as the juxtaposition of two dissimilar images of the same community. At the level of function, finally, the style provokes a reconsideration, and perhaps even a reconfiguration, of the social order itself. With insights from literary studies, philosophical aesthetics and political theory, Kafka's Stereoscopes offers a detailed but highly readable argument for the relevance of Kafka's literary works in today's political reality.
This book is devoted to a thorough investigation of the physics and applications of the vacuum arc – a highly-ionized metallic plasma source used in a number of applications – with emphasis on cathode spot phenomena and plasma formation. The goal is to understand the origins and behavior of the various complex and sometimes mysterious phenomena involved in arc formation, such as cathode spots, electrode vaporization, and near-electrode plasma formation. The book takes the reader from a model of dense cathode plasma based on charge-exchange ion-atom collisions through a kinetic approach to cathode vaporization and on to metal thermophysical properties of cathodes. This picture is further enhanced by an in-depth study of cathode jets and plasma acceleration, the effects of magnetic fields on cathode spot behavior, and electrical characteristics of arcs and cathode spot dynamics. The book also describes applications to space propulsion, thin film deposition, laser plasma generation, and magnetohydrodynamics, making this comprehensive and up-to-date volume a valuable resource for researchers in academia and industry.
Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
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