Guy Rabbat's Books

The Second Formation of Islamic Law

By: Guy Burak

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The Second Formation of Islamic Law

By: Guy Burak

The Second Formation of Islamic Law offers a new periodization of Islamic legal history in the eastern Islamic lands.

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Page Count

293

Publisher

Cambridge University Press

Published Date

ISBN 10

110709027X

ISBN 13

9781107090279

Stories of Origins in the Bible and Ancient Mediterranean Literature

By: Guy Darshan

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Stories of Origins in the Bible and Ancient Mediterranean Literature

By: Guy Darshan

Examines a series of parallels between the stories of origins in the Bible and ancient Greek genealogical writings from the 7–5 centuries BCE, as well as other early Eastern Mediterranean (Phoenician and Anatolian) sources from the first millennium BCE, some of which have only been published in recent years.

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Page Count

357

Publisher

Cambridge University Press

Published Date

ISBN 10

1009344498

ISBN 13

9781009344494

Real-Time UNIX® Systems

Design and Application Guide

By: Borko Furht,Dan Grostick,David Gluch,Guy Rabbat,John Parker,Meg McRoberts

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Real-Time UNIX® Systems

Design and Application Guide

By: Borko Furht,Dan Grostick,David Gluch,Guy Rabbat,John Parker,Meg McRoberts

A growing concern of mine has been the unrealistic expectations for new computer-related technologies introduced into all kinds of organizations. Unrealistic expectations lead to disappointment, and a schizophrenic approach to the introduction of new technologies. The UNIX and real-time UNIX operating system technologies are major examples of emerging technologies with great potential benefits but unrealistic expectations. Users want to use UNIX as a common operating system throughout large segments of their organizations. A common operating system would decrease software costs by helping to provide portability and interoperability between computer systems in today's multivendor environments. Users would be able to more easily purchase new equipment and technologies and cost-effectively reuse their applications. And they could more easily connect heterogeneous equipment in different departments without having to constantly write and rewrite interfaces. On the other hand, many users in various organizations do not understand the ramifications of general-purpose versus real-time UNIX. Users tend to think of "real-time" as a way to handle exotic heart-monitoring or robotics systems. Then these users use UNIX for transaction processing and office applications and complain about its performance, robustness, and reliability. Unfortunately, the users don't realize that real-time capabilities added to UNIX can provide better performance, robustness and reliability for these non-real-time applications. Many other vendors and users do realize this, however. There are indications even now that general-purpose UNIX will go away as a separate entity. It will be replaced by a real-time UNIX. General-purpose UNIX will exist only as a subset of real-time UNIX.

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Page Count

338

Publisher

Springer Science & Business Media

Published Date

ISBN 10

1461539781

ISBN 13

9781461539780

Handbook of Advanced Semiconductor Technology and Computer Systems

By: Guy Rabbat

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Handbook of Advanced Semiconductor Technology and Computer Systems

By: Guy Rabbat

Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented.

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Page Count

942

Publisher

Springer

Published Date

ISBN 10

9401170584

ISBN 13

9789401170581

Book's by Guy Rabbat

The Second Formation of Islamic Law

The Second Formation of Islamic Law

Stories of Origins in the Bible and Ancient Mediterranean Literature

Stories of Origins in the Bible and Ancient Mediterranean Literature

Real-Time UNIX® Systems

Real-Time UNIX® Systems

Handbook of Advanced Semiconductor Technology and Computer Systems

Handbook of Advanced Semiconductor Technology and Computer Systems

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