Greg W. Starr's Books

Nano-CMOS Design for Manufacturability

Robust Circuit and Physical Design for Sub-65nm Technology Nodes

By: Ban P. Wong,Anurag Mittal,Greg W. Starr,Franz Zach,Victor Moroz,Andrew Kahng

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Nano-CMOS Design for Manufacturability

Robust Circuit and Physical Design for Sub-65nm Technology Nodes

By: Ban P. Wong,Anurag Mittal,Greg W. Starr,Franz Zach,Victor Moroz,Andrew Kahng

Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

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Page Count

408

Publisher

John Wiley & Sons

Published Date

ISBN 10

0470382813

ISBN 13

9780470382813

Nano-CMOS Circuit and Physical Design

By: Ban Wong,Anurag Mittal,Yu Cao,Greg W. Starr

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Nano-CMOS Circuit and Physical Design

By: Ban Wong,Anurag Mittal,Yu Cao,Greg W. Starr

Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.

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Page Count

413

Publisher

John Wiley & Sons

Published Date

ISBN 10

0471678864

ISBN 13

9780471678861

Risk and Resolution

By: R. Greg Brown

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Risk and Resolution

By: R. Greg Brown

America repeatedly finds itself mired in military interventions long after public buy-in to the national interest has waned. Why is the timely disengagement of military forces so difficult to achieve? Traditional international relations theories diminish the role of the individual leader in favor of the state or international institutions. Behavioral science theories have in recent years experienced a resurgence. However, the dominant behavioral explanation of foreign policy decision-making, prospect theory, while it focuses on how people tend to make decisions under risk, still minimizes the influence of the individual president. Decisions to disengage military forces are presidential decisions, just like the decisions to commit forces to foreign interventions. If we accept this, then it is important to understand if, and if so why, some presidents inherently are more or less acceptant of the risks disengagement presents. This book operationalizes a competing personality-based model of decision-making under risk. Referred to here as the trait-based model, it is assessed using disengagement opportunities in three varied levels of military intervention across four presidencies: humanitarian relief turned nation-building under George H. W. Bush and Bill Clinton in Somalia, compellent air campaigns turned peace-making/keeping in Bosnia and Kosovo under Clinton, and major combat operations turned irregular warfare in Iraq under George W. Bush and Barack Obama. Data for the model predominantly comes from existing presidential personality profiles based on the dominant model of personality theory, the five-factor model, augmented by Myers-Briggs Type Inventory data from public sources. This study aims to explain the roughly 30 percent of cases which defy prospect theory's predictions and to better explain those cases where prospect theory might heretofore have sufficed. The results suggest specific personality traits do in fact point to presidents' predispositions toward risk, which in turn help explain their disengagement decisions. This work may be only the second to apply the five-factor model to presidential foreign policy decision-making and is the first to do so in the context of disengagement decisions. Hopefully it will foster further work in both areas.

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Page Count

191

Publisher

Page Publishing Inc

Published Date

ISBN 10

1644248832

ISBN 13

9781644248836

Book's by Greg W. Starr

Nano-CMOS Design for Manufacturability

Nano-CMOS Design for Manufacturability

Nano-CMOS Circuit and Physical Design

Nano-CMOS Circuit and Physical Design

Risk and Resolution

Risk and Resolution

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