Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Faced with discrimination, early Chinese immigrants had little choice but to create their own economic niche. From the turn of the twentieth century into the 1950s, generations of Chinese immigrants toiled as laundry workers. This book poignantly describes why the Chinese laundry remains a symbol of hard work, sacrifice and enduring hardship.
This book offers a cultural history of modern China by looking at the tension between memory and history. Mainstream books on China tend to focus on the hard aspects of economics, government, politics, or international relations. This book takes a humanistic look at modern changes and examines how Chinese intellectuals and artists experienced trauma, social upheavals, and transformations. Drawing on a wide array of sources in political and aesthetic writings, literature, film, and public discourse, the author has portrayed the unique ways the Chinese imagine and portray their own historical destiny in the midst of trauma, catastrophe, and runaway globalization.
Utilizing social surveys, participant observation, interviews, life histories, oral testimony and documentary evidence, adherence to Chinese cultural traditions in Alberta is found to be inversely related to the accessibility of opportunity within the wider social context.
Principles of Airway Management, 4th Edition, reviews the essential aspects of airway management: anatomy, equipment, intubation, fiberoptic endoscopy, surgical approaches, intubating LMA (lightwand), pediatric airway, CPR, and mechanical ventilation. The book features well-balanced discussions of the complexities and difficult issues associated with airway management; excellent organization that ensures the material can be learned and applied to various situations; the latest equipment and techniques; summary boxes which highlight the most important points of each chapter; and more than 400 illustrations (many in color, for the first time), tables, and boxes.
Ternary and Quaternary Blended Alkali-Activated Binder Ternary and Quaternary Blended Alkali-Activated Binder: Engineering Properties and Performance consolidates the findings in the process of the development of new classes of blended alkali-activated binder system by the author. It covers extensively on mechanical and durability properties of the ternary and quaternary blended alkali-activated material. Some of the key advantages of this book are the detailed elaborations on the following aspects: · Material design and formulation of the ternary and quaternary blended alkali-activated binder system · Fabrication process to produce the materials · Key engineering properties and behaviour of the materials · Fundamental concepts in the design and fabrication of the materials · Approach for reduction of the embodied carbon emission of alkali-activated binders through the synergistic activation method Cheah Chee Ban is a prominent researcher and author in the field of sustainable concrete materials and technology. He found that it is possible to produce new binder for the construction industry to replace the role of cement. This green binder material is produced from industrial by-products in the iron making and electrical power sectors that commonly face disposal problem. Therefore, the production of the binder material allows an alternative pathway for the recycling of waste materials. The technology being developed eliminates the need to extract limestones for the use as raw material in the concrete production; and therefore preserves the natural limestone hills. Currently, a total of six national patents and one international patent of his research have been filed and one national patent has been granted for the green concrete technology. Besides this, he has published over 49 research articles on the subject matter in the international scientific databases such as Scopus and ScienceDirect.
Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
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